OSU Fees Online

The DWL 66fs is a lithography tool that enables user designs to be implemented by directly writing the pattern onto a photoresist-coated substrate or generating optical masks for conventional photolithography. Users are charged a flat fee of $90.00 per mask for materials. Tool time is billed at a rate of $25.00 per hour, rounded to the nearest whole hour, one hour minimum per mask.

Lithography tool for directly writing the pattern onto a photo-resist-coated substrate or generating optical masks. Academic/Government users are charged a flat fee of $50.00 per mask for materials. Tool time is billed at a rate of $11.00 per hour, rounded to the nearest whole hour. Users are charged a one hour minimum per mask on this tool.

Lithography tool for directly writing the pattern onto a photo-resist-coated substrate or generating optical masks. Academic/Government users are charged a flat fee of $50.00 per mask for materials. Tool time is billed at a rate of $11.00 per hour, rounded to the nearest whole hour. Users are charged a one hour minimum per mask on this tool.

Lithography tool for directly writing the pattern onto a photo-resist-coated substrate or generating optical masks. Academic/Government users are charged a flat fee of $50.00 per mask for materials. Tool time is billed at a rate of $11.00 per hour, rounded to the nearest whole hour. Users are charged a one hour minimum per mask on this tool.